Publications

Kerim T. Arat: Simulation of Electron-Matter Interaction in Electron Beam Lithography and Metrology. TU Delft, Dissertation, https://doi.org/10.4233/uuid:52c5c8c7-edc7-4cf8-9945-bcd94e30f9d8

Kerim T. Arat, Cornelis W. Hagen: Model sensitivity analysis of Monte-Carlo based SEM simulations, Results in Physics, Volume 19, 12/2020, 103545, https://doi.org/10.1016/j.rinp.2020.103545

Kerim T. Arat, Thomas Klimpel, Cornelis W. Hagen: Model improvements to simulate charging in scanning electron microscope. Journal of Micro/Nanolithography, MEMS, MOEMS. 12/2019; 18(04):1. https://doi.org/10.1117/1.JMM.18.4.044003

Kerim T. Arat, Aernout C. Zonnevylle, Wilhelmus S. M. M. Ketelaars, Nikola Belic, Ulrich Hofmann, Cornelis W. Hagen: Electron Beam Lithography on Curved or Tilted Surfaces: Simulations and Experiments. Journal of Vacuum Science & Technology B 09/2019; 37(5): 051604. https://doi.org/10.1116/1.5120632
Kerim T. Arat, Thomas Klimpel, Aernout C. Zonnevylle, Wilhelmus S. M. M. Ketelaars, Carel Th. H. Heerkens, Cornelis W. Hagen: Charge-induced pattern displacement in E-beam lithography. Journal of Vacuum Science & Technology B 09/2019; 37(5):051603, https://doi.org/10.1116/1.5120631

Kerim Tugrul Arat, Jens Bolten, Aernout Christiaan Zonnevylle, Pieter Kruit, Cornelis Wouter Hagen: Estimating Step Heights from Top-Down SEM Images. Microscopy and Microanalysis, 05/2019, https://doi.org/10.1017/S143192761900062X

Kerim T. Arat, Thomas Klimpel, Cornelis W. Hagen: Model improvements to simulate charging in SEM. Proc. SPIE 10585, Metrology, Inspection, and Process Control for Microlithography XXXII; 03/2018, https://doi.org/10.1117/12.2297478

Jens Bolten, Caroline Porschatis, Thorsten Wahlbrink, Max C. Lemme, Nezih Ünal, Kerim T. Arat: Challenges for scanning electron microscopy and inspection on the nanometer scale for non-IC application: and how to tackle them using computational techniques. Proc. SPIE 10446, 33rd European Mask and Lithography Conference; 09/2017, https://doi.org/10.1117/12.2279564

K. T. Arat, J. Bolten, T. Klimpel, N. Unal: Electric fields in SEM simulations. Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography; 03/2016, https://doi.org/10.1117/12.2219182